SUBSTRATE PROCESSING APPARATUS INCLUDING SEMICIRCLE-TYPE ANTENNA

摘要

PURPOSE: A substrate processing apparatus is provided to obtain process uniformity for a processed object using plasma. CONSTITUTION: A substrate processing apparatus includes a chamber where a substrate is processed. The chamber blocks the substrate from the outside by providing an internal space blocked from the outside. The chamber includes a lower chamber(10) having an opened lower part and a chamber cover(12) opening and closing a top part of an upper chamber. The chamber cover is fixed on the top part of the lower chamber with a fixing ring(32). The lower chamber has a path(14) formed on one side wall. The substrate goes in and out from the inside of the lower chamber through the path. The path is opened and closed with a gate valve(16) installed on the outside of the lower chamber. An exhaust pipe(18) is formed on the other wall side of the lower chamber. The exhaust pipe is connected to an exhaust line(19a).