| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition and an actinic ray-sensitive or radiation-sensitive film using the composition and a pattern formation method which simultaneously satisfy sensitivity, resolution, pattern shape, line edge roughness and dry etching resistance in lithography adopting, as an exposure light source, especially an electron beam, x-rays or EUV light. <P>SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains resin (P) including a repeating unit (A) which is decomposed upon irradiation with actinic rays or radiation to generate an acid and a repeating unit (C) which has an aromatic ring and a lactone structure. <P>COPYRIGHT: (C)2012,JPO&INPIT |
