发明名称 E-Mode High Electron Mobility Transistor And Method Of Manufacturing The Same
摘要 According to an example embodiment, a high electron mobility transistor (HEMT) includes a substrate, a buffer layer on the substrate, a channel layer on the buffer layer, and a barrier structure on the channel layer. The buffer layer includes a 2-dimensional electron gas (2DEG). A polarization of the barrier structure varies in a region corresponding to a gate electrode. The HEMT further includes and the gate electrode, a source electrode, and a drain electrode on the barrier structure.
申请公布号 US2012086049(A1) 申请公布日期 2012.04.12
申请号 US201113222322 申请日期 2011.08.31
申请人 HWANG IN-JUN;KIM JONG-SEOB;CHOI HYUK-SOON;HONG KI-HA;SHIN JAI-KWANG;OH JAE-JOON;SAMSUNG ELECTRONICS CO., LTD. 发明人 HWANG IN-JUN;KIM JONG-SEOB;CHOI HYUK-SOON;HONG KI-HA;SHIN JAI-KWANG;OH JAE-JOON
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
代理机构 代理人
主权项
地址