发明名称 Abrasive slurry and method of production of photovoltaic wafers
摘要 The present invention relates to a method for production of photovoltaic wafers and abrasive slurries for multi-wire sawing of wafers for photovoltaic applications, and more specific to abrasive slurries which are easy to remove from the wafers after sawing, where the abrasive slurry comprises one part recycled abrasive slurry, an alkali in sufficient amount to provide a pH in the abrasive slurry mixture in the range from 6.0 to 9.0, and one part novel abrasive slurry in an amount sufficient to provide an ion content in the abrasive slurry mixture to provide an electric conductivity of less than 50 µS/cm. Also shown is an abrasive slurry. The abrasive slurry may be employed in a polar organic liquid e.g. polyethylene glycol (PEG), the abrasive particles may be silicon carbide and the alkali is preferably a hydroxide of alkali or alkaline earth metals e.g. potassium hydroxide (KOH).
申请公布号 GB2484348(A) 申请公布日期 2012.04.11
申请号 GB20100017049 申请日期 2010.10.08
申请人 REC WAFER NORWAY AS 发明人 MOHAN MENON;ANNE LOHNE;ERIK SAUAR;STIAN SANNES
分类号 C09K3/14;B28D5/00 主分类号 C09K3/14
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