Method for fabrication of a photovoltaic device including making an irregularly surfaced substrate

摘要

A method for making an irregularly surfaced substrate by immersing a crystalline silicon substrate in an alkaline solution to anisotropically etch a surface of the substrate so that an irregularity structure is imparted to the surface of the substrate. The alkaline solution contains an additive represented by the following general formula (1):
(in the formula, X is a carboxyl, sulfonic, sulfate ester, phosphate ester or quaternary ammonium group; R1 - R5 are independently a hydrogen atom or an alkyl, alkenyl or alkoxy group; and at least one of R1 - R5 has 3 or more carbon atoms) .