COMPOSITION FOR FORMING RESIST LOWER LAYER FILM, POLYMER, RESIST LOWER LAYER FILM, PROCESS FOR FORMING PATTERN AND PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A composition for forming a resist sub layer, polymer, a resist sub layer, a patter forming method, and a semiconductor device manufacturing method are provided to improve the etching speed of a pattern forming process based on a dry etching technique. CONSTITUTION: A composition for forming a resist sub layer includes polymer with a cyclic carbonate structure. A method for forming patterns includes the following: the resist sub layer is formed by applying the composition on a substrate; a resist layer is formed by applying a resist composition on the resist sub layer; the resist layer is exposed by selectively irradiating radiation using a photo mask; the exposed resist layer is developed to form resist patterns; the resist patterns are used as a mask for dry etching the resist sub layer and the substrate to form patterns.