发明名称 MASKING FILM
摘要 <p>PURPOSE: A masking film is provided to have excellent antistatic properties, to hardly generate static electricity at removing exfoliation, and to remove static electricity even in case of being generated, thereby not causing the damage of electric ink. CONSTITUTION: A masking film comprises an adhesive layer containing a polysiloxane based resin which contains quaternary ammonium salts, a base film, a lamination of anti-fouling antistatic layer containing a conductive polymer, a binder resin and a fluorinated resin. The adhesive layer is formed of an antistatic adhesive composition, and the adhesive composition comprises 50-90 weight% of polysiloxane based resin containing 4-5 weight% of the quaternary ammonium salts, 0.1-5 weight% of hardener, and 5-45 weight% of solvent. The coating thickness of the adhesive layer is 15-30 micron.</p>
申请公布号 KR20120032601(A) 申请公布日期 2012.04.06
申请号 KR20100094015 申请日期 2010.09.29
申请人 KOLON INDUSTRIES, INC. 发明人 KIM, JUNG SEOK;KIM, CHONG WON;BAEK, SANG HYUN;CHOI, SUK WON;KIM, SI MIN
分类号 C09J7/02;B32B27/00;C09J183/04;G02B5/20 主分类号 C09J7/02
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