SALT AND PHOTORESIST COMPOSITION

摘要

PURPOSE: A photoresist composition and salt are provided to be used as an acid generator and to obtain photoresist pattern. CONSTITUTION: A salt for an acid generator is denoted by chemical formula I. The acid generator contains the salt of chemical formula I. A photoresist composition contains the acid generator and instable group in acid. The composition additionally contains basic compounds. A method for preparing a photoresist pattern comprises: a step of applying the photoresist composition on a substrate to form a photoresist composition layer; a step of drying the layer to form a photoresist film; a step of exposing the photoresist film; a step of heating the photoresist film; and a step of developing the photoresist film.