| 摘要 |
<p>Provided is a film-forming apparatus that ensures position alignment accuracy, saves space, is capable of handling large substrates of fourth generation or later, and has excellent utility. The film-forming apparatus for forming a film by adhering a film material to a substrate (2) held upright in a vacuum chamber (1) via a mask (3) is equipped with an alignment drive mechanism for aligning the mask (3) and the substrate (2) by moving and adjusting an alignment frame (4), to which the mask (3) is attached in an upright state, relative to the substrate (2) so that the mask (3) is positioned correctly in relation to the substrate (2). The alignment drive mechanism comprises an upper mechanism provided outside the vacuum chamber (1) and on the upper side thereof, or a lower drive mechanism provided outside the vacuum chamber (1) and on the lower side thereof.</p> |
