发明名称 |
Object Inspection Systems and Methods |
摘要 |
Disclosed are systems and methods for object inspection, in particular for inspection of reticles used in a lithography process. The method includes interferometrically combining a reference radiation beam with a probe radiation beam, and storing their complex field images. The complex field image of one object is then compared with that of a reference object to determine the differences. The systems and methods have particular utility in the inspection of a reticle for defects. |
申请公布号 |
US2012081684(A1) |
申请公布日期 |
2012.04.05 |
申请号 |
US201013321703 |
申请日期 |
2010.04.13 |
申请人 |
DEN OEF ARIE JEFFREY;VLADIMIRSKY YULI;SHMAREV YEVGENIY KONSTANTINOVICH;SCACCABAROZZI LUIGI;ALBERT ROBERT;JACOBS RICHARD DAVID;ASML NETHERLANDS B.V.;ASML HOLDING N.V. |
发明人 |
DEN OEF ARIE JEFFREY;VLADIMIRSKY YULI;SHMAREV YEVGENIY KONSTANTINOVICH;SCACCABAROZZI LUIGI;ALBERT ROBERT;JACOBS RICHARD DAVID |
分类号 |
G03B27/54;G01B9/02;G01B9/021 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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