PATTERN FORMING METHOD AND PATTERN FORMING APPARATUS

摘要

PURPOSE: A pattern formation method and a pattern forming device are provided to stable a starting and end location of the pattern by returning and moving a nozzle while discharging the coating solutions. CONSTITUTION: A pattern formation method comprises next steps: relatively transferring a nozzle along the surface of a substrate to an injection moving direction; successively discharging coating liquid including materials for developing pattern from an outlet of nozzle; forming a line shaped pattern on the substrate surface; A relative position of the nozzle compare to the substrate surface reaches to an end point of a predetermined pattern(X3); transferring the nozzle along the surface of substrate to opposite direction of the injection moving direction; stopping discharge of the coating solutions from the outlet. Gradually reducing vent amount before relative position of the nozzle compare to the substrate surface reaches to end point of the pattern; discharging the coating solution from the outlet by pressurizing the coating solutions within the nozzle; reducing discharging rate by stop pressurizing the coating solutions; and transferring the nozzle to the pattern end site.