发明名称 THIN FILM LAMINATE INSPECTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To solve a problem that it is necessary to maintain and control a relation among a focus position of an X-ray, a sample surface, and a rotational shaft at an accuracy of 1 &mu;m or less while changing an incident angle, in order to measure a film thickness of a minute area with an X-ray reflectivity method by using an incident X-ray having a beam size of 10 &mu;m or less. <P>SOLUTION: An X-ray lens is used as an amplitude division beam splitter and a light condensing optical system in the present invention. The X-ray refracted by the X-ray lens gives an angle distribution in which the X-ray is focused in a size of 10 &mu;m or less at a focal point. A thin film laminate is disposed at the focal point. An object wave which is a mirror-reflected X-ray and a reference wave which is an X-ray transmitted through the X-ray lens are superposed and interfered with each other by using the X-ray lens disposed downstream of the thin film laminate. A phase of the reflection X-ray is analyzed based on an interval and position of interference fringes reflecting an optical path difference and a phase difference generated in the thin film laminate, and the film thickness of the minute area is measured and inspected. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012068180(A) 申请公布日期 2012.04.05
申请号 JP20100214668 申请日期 2010.09.27
申请人 HITACHI LTD 发明人 UEDA KAZUHIRO;YONEYAMA AKIO;NANBU AKIRA
分类号 G01N23/201 主分类号 G01N23/201
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