ARRANGEMENT FOR MIRROR TEMPERATURE MEASUREMENT AND/OR THERMAL ACTUATION OF A MIRROR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

The invention concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus, wherein the mirror (101, 301, 401, 701, 801, 901) has an optical effective surface (101a, 301a, 401a, 701a, 801a, 901a) and at least one access passage (110, 310, 410, 710, 711, 712, 810, 811, 812, 910) extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of said effective surface, wherein the arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror (101, 301, 401, 701, 801, 901) by means of electromagnetic radiation which is propagated along the access passage (110, 310, 410, 710, 711, 712, 810, 811, 812, 910, 910'), and wherein the electromagnetic radiation is reflected a plurality of times within the access passage (110, 310, 410, 710, 711, 712, 810, 811, 812, 910)