发明名称 STRUCTURE OF SUBSTRATE SUPPORTING TABLE, AND PLASMA PROCESSING APPARATUS
摘要 Disclosed is the structure of a substrate supporting table wherein corrosion of a bellows is eliminated, generation of dusts from the bellows is suppressed, and the volume and the weight of the sections to be driven are reduced. A plasma processing apparatus is also disclosed. In the substrate supporting table for the plasma processing apparatus (10), a cylindrical inner tube (12), the bellows (13), an outer tube (14) and a cover member (15) are sequentially disposed concentrically from the inner side, and a drive member (21) to be driven by means of a drive mechanism (24) is attached to the rear surface of the placing table (16) through an opening (llb) and the inside of the inner tube (12).
申请公布号 EP2436802(A1) 申请公布日期 2012.04.04
申请号 EP20100780508 申请日期 2010.05.24
申请人 MITSUBISHI HEAVY INDUSTRIES, LTD. 发明人 MATSUDA RYUICHI;YOSHIDA KAZUTO
分类号 C23C16/44;H01L21/3065;H01L21/683 主分类号 C23C16/44
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