SUPPORT MEMBER AND APPARATUS FOR TREATING SUBSTRATE WITH THE SAME

摘要

PURPOSE: A supporting member and a substrate processing apparatus including the same are provided to improve substrate processing process efficiency by preventing a phenomenon that washing solution remains in a chucking pin. CONSTITUTION: A chamber(10) offers a sealed internal space. A treatment basin(110) offers a space for processing a wafer in inside. A supporting member(120) supports the wafer in the internal space of the treatment basin. A injecting member(140) sprays processing liquid to the wafer. The injecting member comprises a nozzle(142) and a transfer arm(144). A spin head is located in the inner side of the treatment basin and has a supporting plane which faces to a substrate. A plurality of chucking pins is arranged according to an edge of the substrate and chucks a part of the edge of the substrate.