| 摘要 |
PURPOSE: A slurry composition for polishing is provided to have an excellent abrasive dispersing stability, polishing speed and surface state after polishing, and to easily remove residue and other impurities even when dispersed in an oily dispersion medium. CONSTITUTION: A slurry composition for polishing comprises a hard abrasive, an organic dispersion medium and a mixed surfactant of which the HLB(hydrophile-lipophile balance) value is 6-9. The mixed surfactant comprises a first surfactant and a second surfactant of which the HLB values are different each other. The first surfactant is a hydrophilic surfactant with an HLB value of 8 or more, and the second surfactant is a lipophilic surfactant with an HLB value of 6 or less. The lipophilic surfactant is one selected from a group consisting of sorbitan ester, glyceryl ester and combinations thereof.
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