DEVICE FOR MANUFACTURING POLYCRYSTALLINE SILICON THIN FILMS

摘要

The present invention relates to a device for applying an electric field, comprising: a chamber; a substrate stage which is installed in the chamber, and on which a substrate including a conductive film is placed; a power supply unit installed in the chamber, including an electrode terminal provided with a support and a first conductive electrode disposed in the central region of the support; and a second conductive electrode disposed between the electrode terminal and the conductive film. Thus, the present invention can provide a device for manufacturing polycrystalline silicon thin films that is capable of forming polycrystalline silicon thin films having uniform crystallinity by uniformly forming an electric field over the conductive film.