发明名称 |
ELECTRICAL FUSE STRUCTURE AND METHOD OF FABRICATING SAME |
摘要 |
A high programming efficiency electrical fuse is provided utilizing a dual damascene structure located atop a metal layer. The dual damascene structure includes a patterned dielectric material having a line opening located above and connected to an underlying via opening. The via opening is located atop and is connected to the metal layer. The dual damascene structure also includes a conductive feature within the line opening and the via opening. Dielectric spacers are also present within the line opening and the via opening. The dielectric spacers are present on vertical sidewalls of the patterned dielectric material and separate the conductive feature from the patterned dielectric material. The presence of the dielectric spacers within the line opening and the via opening reduces the area in which the conductive feature is formed. As such, a high programming efficiency electrical fuse is provided in which space is saved.
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申请公布号 |
US2012074520(A1) |
申请公布日期 |
2012.03.29 |
申请号 |
US20100890941 |
申请日期 |
2010.09.27 |
申请人 |
YANG CHIH-CHAO;HORAK DAVID V.;KOBURGER, III CHARLES W.;PONOTH SHOM;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
YANG CHIH-CHAO;HORAK DAVID V.;KOBURGER, III CHARLES W.;PONOTH SHOM |
分类号 |
H01L23/525;H01L21/768 |
主分类号 |
H01L23/525 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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