发明名称 |
Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method |
摘要 |
A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
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申请公布号 |
US2012077126(A1) |
申请公布日期 |
2012.03.29 |
申请号 |
US201013375026 |
申请日期 |
2010.05.20 |
申请人 |
MORI KAZUNORI;HAGIWARA YUJI;NAGAMORI MASASHI;ISONO YOSHIMI;NARIZUKA SATORU;MAEDA KAZUHIKO |
发明人 |
MORI KAZUNORI;HAGIWARA YUJI;NAGAMORI MASASHI;ISONO YOSHIMI;NARIZUKA SATORU;MAEDA KAZUHIKO |
分类号 |
G03F7/20;C07C69/54;C07C69/593;C08F214/18;C08K5/05;C09D127/12;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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地址 |
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