MONOMER DEPOSITION APPARATUS

摘要

Provided is a monomer deposition apparatus which minimizes the deposition of a monomer onto members around a substrate when the monomer is deposited onto the substrate. To this end, the monomer deposition apparatus includes a chamber defining a processing space in which the substrate is processed, and a deposition unit, at least one portion of which is received in the chamber and which is spaced a predetermined distance from the substrate so as to discharge the monomer onto the substrate. The monomer deposition apparatus further includes a cooling plate disposed adjacently to a circumference of the deposition unit such that there is no interference with the discharge of the monomer, the cooling plate being spaced a predetermined distance from the substrate to cool the monomer which is not deposited onto the substrate. Thus, since the monomer, which is not deposited onto the substrate, is cooled by the cooling plate, the deposition of monomer vapors onto members around the substrate may be minimized. Therefore, since the period for scheduled maintenance may be extended, productivity may be improved and manufacturing costs may be reduced.