COMPOSITION FOR REMOVING A PHOTORESIST

摘要

PURPOSE: A composition for a photoresist stripping solution is provided to secure operational stability by completely stripping and washing photoresist without the undesirable corrosion of metal wires. CONSTITUTION: A composition for a photoresist stripping solution contains cyclic amine, a solvent, a stripping accelerator, and selectively an anticorrosive agent. The cyclic amine is one or more selected from a group including 1-(2-hydroxyethyl)piperazine, 1-(2-aminoethyl)piperazine, 1-(2-hydroxyethyl)methylpiperazine, N-(3-aminopropyl)morpholine, 2-methylpiperazine, 1-methylpiperazine, 1-amino-4-methylpiperazine, 1-benzylpiperazine, and 1-phenylpiperazine. The solvent is a protic polar solvent, a non-protic polar solvent, or the mixture of the same. The anticorrosive agent is selected from a group including triazole-based compounds, mercapto-based compounds, alkyl gallate-based compounds, and the mixture of the same.