发明名称 Reflective optical element for EUV lithography device
摘要 A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b) prevents chemical interaction between the first additional intermediate layer (23a,b) and the adjoining spacer layer (21) and/or the absorber layer (22).
申请公布号 US8144830(B2) 申请公布日期 2012.03.27
申请号 US20090536251 申请日期 2009.08.05
申请人 YAKSHIN ANDREY E.;VAN DE KRUIJS ROBBERT W. E.;BIJKERK FRED;LOUIS ERIC;NEDELCU ILEANA;CARL ZEISS GMBH 发明人 YAKSHIN ANDREY E.;VAN DE KRUIJS ROBBERT W. E.;BIJKERK FRED;LOUIS ERIC;NEDELCU ILEANA
分类号 G21K3/00 主分类号 G21K3/00
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