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发明名称
Plasma enhanced chemical vapor deposition apparatus capable of supplying process gas using multichannel
摘要
申请公布号
KR101121202(B1)
申请公布日期
2012.03.23
申请号
KR20080113456
申请日期
2008.11.14
申请人
发明人
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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