发明名称 |
METHOD FOR ELECTROPLATING LONG CONDUCTIVE SUBSTRATE, METHOD FOR MANUFACTURING COPPER-COATED LONG CONDUCTIVE SUBSTRATE USING THE METHOD AND ROLL-TO-ROLL TYPE ELECTROPLATING APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a copper-coated long conductive substrate, whereby surface accuracy of a copper plating layer on the copper-coated long conductive substrate can be improved. <P>SOLUTION: The method for electroplating a long conductive substrate comprises: sending the long conductive substrate so that it is kept substantially horizontal in its width direction; and depositing a metal plating film layer on a surface of a seed layer by a wet plating method by an electroplating method using a plurality of insoluble anodes. The plurality of insoluble anodes are electrically divided into at least two portions in a sending direction. Among the divided insoluble anodes, those depositing an electroplating film with a total film thickness of ≤2 μm has a current density controlled to ≤2 mA/cm<SP POS="POST">2</SP>. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012057191(A) |
申请公布日期 |
2012.03.22 |
申请号 |
JP20100199038 |
申请日期 |
2010.09.06 |
申请人 |
SUMITOMO METAL MINING CO LTD |
发明人 |
OTAKI KEIICHI |
分类号 |
C25D21/12;C25D5/56;C25D7/06;C25D17/00;C25D17/10;C25D21/00;H05K3/18 |
主分类号 |
C25D21/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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