| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a power supply controller suitable for shortening the time required until impedance has been matched and plasma is stabilized when a plurality of process conditions are switched. <P>SOLUTION: The power supply controller of a plasma processing apparatus includes a plasma generation part for generating plasma in a process chamber, according to one embodiment. It includes a high frequency power supply for supply electric power to the plasma generation part, a memory part which stores a matching information containing a first matching value corresponded to the process information of a first process condition, a second matching value corresponded to the process information of a second process condition, and a third matching value corresponding to the process information of a transient state switching from the first process condition to the second process condition, and a matching circuit for impedance matching based on the matching information. <P>COPYRIGHT: (C)2012,JPO&INPIT |
