发明名称 |
METHOD FOR MANUFACTURING PHOSPHORUS-CONTAINING COPPER ANODE MATERIAL FOR PLATING, WHICH COMPRISES UNIFORMLY DISPERSED PHOSPHORUS COMPONENT AND HAS FINE, UNIFORM CRYSTAL STRUCTURE, AND THE PHOSPHORUS-CONTAINING COPPER ANODE MATERIAL FOR PLATING |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a phosphorus-containing copper anode material for plating, which is suitably used as an anode material for plating, comprises a uniformly dispersed phosphorus component and has a fine, uniform crystal structure, and the phosphorus-containing copper anode material for plating manufactured thereby. <P>SOLUTION: The phosphorus-containing copper anode material for plating wherein the phosphorus component is uniformly dispersed and the crystal structure is fine and uniform is obtained by: repeating deep-drawing and forging of a phosphorus-containing copper ingot by repeating multiaxial compression and drawing at least once at an initial temperature of 600-900°C; subsequently performing hot- or cold-working at an initial temperature of ≤550°C; and, if necessary, further performing stress-relief annealing at a temperature ranging from 300 to 500°C, provided that the phosphorus-containing copper ingot has a Cu purity of ≥99.99 mass% and comprises 300-1,000 mass ppm P and ≤10 mass ppm oxygen. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012057186(A) |
申请公布日期 |
2012.03.22 |
申请号 |
JP20100198500 |
申请日期 |
2010.09.06 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
KUMAGAI TSUTOMU;SATO YUJI;NAKAYA KIYOTAKA;KATO NAOKI |
分类号 |
C22F1/08;B21J1/04;B21J5/00;C22C9/00;C22F1/00;C22F1/02 |
主分类号 |
C22F1/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|