发明名称 METHOD FOR MANUFACTURING PHOSPHORUS-CONTAINING COPPER ANODE MATERIAL FOR PLATING, WHICH COMPRISES UNIFORMLY DISPERSED PHOSPHORUS COMPONENT AND HAS FINE, UNIFORM CRYSTAL STRUCTURE, AND THE PHOSPHORUS-CONTAINING COPPER ANODE MATERIAL FOR PLATING
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a phosphorus-containing copper anode material for plating, which is suitably used as an anode material for plating, comprises a uniformly dispersed phosphorus component and has a fine, uniform crystal structure, and the phosphorus-containing copper anode material for plating manufactured thereby. <P>SOLUTION: The phosphorus-containing copper anode material for plating wherein the phosphorus component is uniformly dispersed and the crystal structure is fine and uniform is obtained by: repeating deep-drawing and forging of a phosphorus-containing copper ingot by repeating multiaxial compression and drawing at least once at an initial temperature of 600-900&deg;C; subsequently performing hot- or cold-working at an initial temperature of &le;550&deg;C; and, if necessary, further performing stress-relief annealing at a temperature ranging from 300 to 500&deg;C, provided that the phosphorus-containing copper ingot has a Cu purity of &ge;99.99 mass% and comprises 300-1,000 mass ppm P and &le;10 mass ppm oxygen. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012057186(A) 申请公布日期 2012.03.22
申请号 JP20100198500 申请日期 2010.09.06
申请人 MITSUBISHI MATERIALS CORP 发明人 KUMAGAI TSUTOMU;SATO YUJI;NAKAYA KIYOTAKA;KATO NAOKI
分类号 C22F1/08;B21J1/04;B21J5/00;C22C9/00;C22F1/00;C22F1/02 主分类号 C22F1/08
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