发明名称 Metal oxide alloy layer, method of forming the metal oxide alloy layer, and methods of manufacturing a gate structure and a capacitor including the metal oxide alloy layer
摘要 A metal oxide alloy layer comprises a first layer including a first metal oxide and having a first thickness, and a second layer formed on the first layer, the second layer including a second metal oxide and having a second thickness, wherein a value of the first thickness is such that the first metal oxide is allowed to move into the second layer and a value of the second thickness is such that the second metal oxide is allowed to move into the first layer to form a single-layered structure in which the first and second metal oxides are mixed.
申请公布号 US8138057(B2) 申请公布日期 2012.03.20
申请号 US20080196566 申请日期 2008.08.22
申请人 LEE JUNG-HO;CHOI JUNG-SIK;CHO JUN-HYUN;EOM TAE-MIN;LEE JI-HYUN;SAMSUNG ELECTRONICS CO., LTD 发明人 LEE JUNG-HO;CHOI JUNG-SIK;CHO JUN-HYUN;EOM TAE-MIN;LEE JI-HYUN
分类号 H01L21/20;H01L21/336 主分类号 H01L21/20
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