| 摘要 |
An exposure apparatus includes a light dividing surface which reflects a certain component of the light beam bifurcated by an illumination optical system, and transmits the remaining component of the light beam, a first photoelectric conversion element which detects the light beam transmitted through the light dividing surface, a second photoelectric conversion element which detects the light beam reflected by the light dividing surface, and a controller which controls the light beam which becomes incident on the substrate, using the outputs from the first photoelectric conversion element and the second photoelectric conversion element while the light emitted by a light source is in a first polarization state, and the outputs from the first photoelectric conversion element and the second photoelectric conversion element while the light emitted by the light source is in a second polarization state.
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