发明名称 |
BY-PRODUCT MITIGATION IN THROUGH-SILICON-VIA PLATING |
摘要 |
PURPOSE: A by-product mitigation in through-silicon-via plating is provided to stabilize a plating liquid through the minimum of the by-product of an accelerating agent which is generated from the accelerating agent and oxygen. CONSTITUTION: The oxygen content of the plating liquid diminishes(102). A wafer substrate is touched with a plating liquid within a plating cell(104). The oxygen content of the plating liquid within the plating cell is less than 1 ppm The plating liquid comprises an accelerating agent less than about 5 ppm. A metal is electroplated on the wafer substrate within the plating cell(106). |
申请公布号 |
KR20120026462(A) |
申请公布日期 |
2012.03.19 |
申请号 |
KR20110091519 |
申请日期 |
2011.09.09 |
申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
WILLEY MARK J.;LEE, HYO SANG |
分类号 |
H01L21/288;H01L21/768 |
主分类号 |
H01L21/288 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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