发明名称 BY-PRODUCT MITIGATION IN THROUGH-SILICON-VIA PLATING
摘要 PURPOSE: A by-product mitigation in through-silicon-via plating is provided to stabilize a plating liquid through the minimum of the by-product of an accelerating agent which is generated from the accelerating agent and oxygen. CONSTITUTION: The oxygen content of the plating liquid diminishes(102). A wafer substrate is touched with a plating liquid within a plating cell(104). The oxygen content of the plating liquid within the plating cell is less than 1 ppm The plating liquid comprises an accelerating agent less than about 5 ppm. A metal is electroplated on the wafer substrate within the plating cell(106).
申请公布号 KR20120026462(A) 申请公布日期 2012.03.19
申请号 KR20110091519 申请日期 2011.09.09
申请人 NOVELLUS SYSTEMS, INC. 发明人 WILLEY MARK J.;LEE, HYO SANG
分类号 H01L21/288;H01L21/768 主分类号 H01L21/288
代理机构 代理人
主权项
地址