发明名称 ION IMPLANTER POWER SUPPLY WHICH IS INTENDED TO LIMIT THE LOADING EFFECT
摘要 The invention relates to a power supply ALT for an ion implanter, the power supply comprising: an electricity generator SOU placed between a substrate-carrier tray PPS and ground E, and a capacitor CDS in a parallel branch likewise connected between the substrate-carrier tray PPS and ground E. The capacitor CDS has a capacitance of less than 5 nF. The invention also provides an ion implanter incorporating the power supply.
申请公布号 KR101124686(B1) 申请公布日期 2012.03.19
申请号 KR20077001042 申请日期 2005.06.14
申请人 发明人
分类号 H01L21/265;H01J37/02;H01J37/317;H01J37/32 主分类号 H01L21/265
代理机构 代理人
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