| 摘要 |
PURPOSE: An arc ion plating method of a plating material including titanium nitride is provided to maximize the quality of products by plating a work piece to give heat resistance, sticking resistance, and high surface roughness. CONSTITUTION: An arc ion plating method of a plating material including titanium nitride comprises steps of: grinding a work piece, lapping the work piece, applying an abrasive on the work piece and grinding the work piece, rinsing the abrasive off the work piece with alcohol and washing the work piece for 5 to 15 minutes with neutral cleanser, rinsing the work piece with distilled water and spraying compressed air to remove the distilled water, inserting the work piece into a vacuum chamber, sequentially raising the internal temperature of the vacuum chamber to 300°C to 400°C to heat the work piece, supplying argon gas of 600sccm into the vacuum chamber to etch the work piece for one and a half hours to 2 hours, supplying current of 80-110A into the vacuum chamber to create arc discharge so that the work piece is irradiated with materials emitted from a target and plated, and discharging the completed work piece by opening the door of the vacuum chamber after the internal temperature of the vacuum chamber is lowered below 100°C.
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