发明名称 HIGH CONDUCTIVITY ELECTROSTATIC CHUCK
摘要 In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising a conductive path covering at least a portion of a workpiece-contacting surface of a gas seal ring of the electrostatic chuck, the conductive path comprising at least a portion of an electrical path to ground; and a main field area of a workpiece-contacting surface of the electrostatic chuck comprising a surface resistivity in the range of from about 108 to about 1012 ohms per square.
申请公布号 WO2012033922(A2) 申请公布日期 2012.03.15
申请号 WO2011US50841 申请日期 2011.09.08
申请人 ENTEGRIS, INC.;VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;SUURONEN, DAVID;STONE, LYUDMILA;BLAKE, JULIAN;STONE, DALE, K.;COOKE, RICHARD, A.;DONNELL, STEVEN;VENKATRAMAN, CHANDRA 发明人 SUURONEN, DAVID;STONE, LYUDMILA;BLAKE, JULIAN;STONE, DALE, K.;COOKE, RICHARD, A.;DONNELL, STEVEN;VENKATRAMAN, CHANDRA
分类号 H01L21/683;B23Q3/15;H01L21/687;H02N13/00 主分类号 H01L21/683
代理机构 代理人
主权项
地址