发明名称 NEAR FIELD EXPOSURE DEVICE, AND NEAR FIELD EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To improve the use efficiency of light energy in a near field exposure device. <P>SOLUTION: A near field exposure device includes a light source 10, and an exposure head 100. The exposure head 100 has a near field light generating portion 80 having at least a first opening 87a and a second opening 87b, and an optical system 55 including a diffraction optical element 40 for dividing exposure light LS from the light source 10 into a plurality of beams including a first beam LB1 corresponding to the first opening 87a and a second beam LB2 corresponding to the second opening 87b. The first beam LB1 is emitted into the first opening 87a to generate near field light ELV1 from a light emitting side of the first opening 87a, and the second beam LB2 is emitted into the second opening 87b to generate near field light ELV2 from a light emitting side of the second opening 87b. An article to be exposed is exposed in parallel by each of near field light generated from each of the first opening 87a and the second opening 87b. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012054445(A) 申请公布日期 2012.03.15
申请号 JP20100196517 申请日期 2010.09.02
申请人 SEIKO EPSON CORP 发明人 FUJII EIICHI
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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