发明名称 COMPOSITION FOR USE IN FORMING LAYER TO BE PLATED, METHOD FOR MANUFACTURING METAL PATTERN MATERIAL, AND NOVEL POLYMER
摘要 <p>The purpose of the present invention is to provide a composition that is for use in forming a layer to be plated and that can form such a layer which is developable with an aqueous solution and exhibits excellent developability and which, even when exposed to high-temperature and high-humidity environment, exhibits high tight adhesion to a plating film (metal film) formed on a surface thereof. This composition contains a polymer which comprises at least units represented by formula (A) and units represented by formula (B).</p>
申请公布号 WO2012032905(A1) 申请公布日期 2012.03.15
申请号 WO2011JP68578 申请日期 2011.08.16
申请人 FUJIFILM CORPORATION;MATSUMURA TOKIHIKO 发明人 MATSUMURA TOKIHIKO
分类号 C23C18/18;C08F8/00;C08F299/00;G03F7/038;G03F7/40;H05K1/03;H05K3/18 主分类号 C23C18/18
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