发明名称 |
COMPOSITION FOR USE IN FORMING LAYER TO BE PLATED, METHOD FOR MANUFACTURING METAL PATTERN MATERIAL, AND NOVEL POLYMER |
摘要 |
<p>The purpose of the present invention is to provide a composition that is for use in forming a layer to be plated and that can form such a layer which is developable with an aqueous solution and exhibits excellent developability and which, even when exposed to high-temperature and high-humidity environment, exhibits high tight adhesion to a plating film (metal film) formed on a surface thereof. This composition contains a polymer which comprises at least units represented by formula (A) and units represented by formula (B).</p> |
申请公布号 |
WO2012032905(A1) |
申请公布日期 |
2012.03.15 |
申请号 |
WO2011JP68578 |
申请日期 |
2011.08.16 |
申请人 |
FUJIFILM CORPORATION;MATSUMURA TOKIHIKO |
发明人 |
MATSUMURA TOKIHIKO |
分类号 |
C23C18/18;C08F8/00;C08F299/00;G03F7/038;G03F7/40;H05K1/03;H05K3/18 |
主分类号 |
C23C18/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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