SURFACE WAVE PLASMA CVD APPARATUS AND FILM FORMING METHOD,申请号KR20117026974-传众专利搜索

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发明名称	SURFACE WAVE PLASMA CVD APPARATUS AND FILM FORMING METHOD
摘要
申请公布号	KR20120023655(A)	申请公布日期	2012.03.13
申请号	KR20117026974	申请日期	2009.05.15
申请人	SHIMADZU CORPORATION	发明人	SUZUKI MASAYASU
分类号	C23C16/511;H01L21/318	主分类号	C23C16/511
代理机构		代理人
主权项
地址

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