发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE: A negative photo-sensitive resin composition, a display device pattern forming method using the same, and a display device including the pattern are provided to improve resolution, permeation, heat-resistance discoloration, and adhesive. CONSTITUTION: A negative photo-sensitive resin composition includes the following: 100 parts by weight of acryl-based copolymer, polyimide-based copolymer, siloxane-based copolymer, or the copolymer of the same; 0.1-30 parts by weight of a photo-initiator; and 0.1-30 parts by weight of a photo-sensitizer represented by chemical formula 1. In chemical formula 1, the n is the integer of 1 to 10. The acryl-based copolymer is obtained by radical-polymerizing acryl monomers under an azo-initiator. The polyimide-based copolymer is obtained from diamine and dianhydride. The siloxane copolymer is obtained by hydrolyzing and condensating silane monomers under acid or base.
申请公布号 KR20120021488(A) 申请公布日期 2012.03.09
申请号 KR20100075050 申请日期 2010.08.03
申请人 DONGJIN SEMICHEM CO., LTD. 发明人 YEO, TAE HOON;KIM, BYUNG UK;YOUN, HYOC MIN;KOO, KI HYUK;YUN, JOO PYP;KIM, DONG MYUNG;SHIN, HONG DAE;KIM, JIN SUN;LEE, SANG HOON;WOO, CHANG MIN
分类号 G03F7/075;G03F7/027;G03F7/028 主分类号 G03F7/075
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