发明名称 |
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE: A negative photo-sensitive resin composition, a display device pattern forming method using the same, and a display device including the pattern are provided to improve resolution, permeation, heat-resistance discoloration, and adhesive. CONSTITUTION: A negative photo-sensitive resin composition includes the following: 100 parts by weight of acryl-based copolymer, polyimide-based copolymer, siloxane-based copolymer, or the copolymer of the same; 0.1-30 parts by weight of a photo-initiator; and 0.1-30 parts by weight of a photo-sensitizer represented by chemical formula 1. In chemical formula 1, the n is the integer of 1 to 10. The acryl-based copolymer is obtained by radical-polymerizing acryl monomers under an azo-initiator. The polyimide-based copolymer is obtained from diamine and dianhydride. The siloxane copolymer is obtained by hydrolyzing and condensating silane monomers under acid or base. |
申请公布号 |
KR20120021488(A) |
申请公布日期 |
2012.03.09 |
申请号 |
KR20100075050 |
申请日期 |
2010.08.03 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
YEO, TAE HOON;KIM, BYUNG UK;YOUN, HYOC MIN;KOO, KI HYUK;YUN, JOO PYP;KIM, DONG MYUNG;SHIN, HONG DAE;KIM, JIN SUN;LEE, SANG HOON;WOO, CHANG MIN |
分类号 |
G03F7/075;G03F7/027;G03F7/028 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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