发明名称 |
NITRIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a normally-off type nitride semiconductor device that is operable at high frequency and can be fabricated only with a well-manageable manufacturing method. <P>SOLUTION: A floating electrode 8 that makes Schottky-contact with an electron supply layer 4 is disposed on the electron supply layer 4 between a source electrode 5 and a drain electrode 6. A gate electrode 7 is disposed on the floating electrode 8 via an insulating film 9. A positive bias voltage is applied to the gate electrode so that electrons are accumulated in the floating electrode. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012049169(A) |
申请公布日期 |
2012.03.08 |
申请号 |
JP20100187075 |
申请日期 |
2010.08.24 |
申请人 |
NEW JAPAN RADIO CO LTD |
发明人 |
FUKAZAWA YOSHIMICHI;FUSHIMI HIROSHI |
分类号 |
H01L21/338;H01L29/423;H01L29/47;H01L29/49;H01L29/778;H01L29/812;H01L29/872 |
主分类号 |
H01L21/338 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|