发明名称 NITRIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a normally-off type nitride semiconductor device that is operable at high frequency and can be fabricated only with a well-manageable manufacturing method. <P>SOLUTION: A floating electrode 8 that makes Schottky-contact with an electron supply layer 4 is disposed on the electron supply layer 4 between a source electrode 5 and a drain electrode 6. A gate electrode 7 is disposed on the floating electrode 8 via an insulating film 9. A positive bias voltage is applied to the gate electrode so that electrons are accumulated in the floating electrode. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012049169(A) 申请公布日期 2012.03.08
申请号 JP20100187075 申请日期 2010.08.24
申请人 NEW JAPAN RADIO CO LTD 发明人 FUKAZAWA YOSHIMICHI;FUSHIMI HIROSHI
分类号 H01L21/338;H01L29/423;H01L29/47;H01L29/49;H01L29/778;H01L29/812;H01L29/872 主分类号 H01L21/338
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