发明名称 FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A structure with which the zero current of a field effect transistor using a conductor-semiconductor junction can be reduced is provided. A floating electrode (102) including a conductor or a semiconductor and being enclosed by an insulator (104) is formed between a semiconductor layer (101) and a gate (105) so as to cross the semiconductor layer (101) and the floating electrode (102) is charged, whereby carriers are prevented from flowing from a source electrode (103a) or a drain electrode (103b). Accordingly, a sufficiently low carrier concentration can be kept in the semiconductor layer (101) and thus the zero current can be reduced.
申请公布号 WO2012029674(A1) 申请公布日期 2012.03.08
申请号 WO2011JP69362 申请日期 2011.08.22
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;TAKEMURA, YASUHIKO 发明人 TAKEMURA, YASUHIKO
分类号 H01L29/786;H01L21/336;H01L21/8242;H01L21/8247;H01L27/108;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L29/786
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