发明名称 |
COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM |
摘要 |
In one embodiment, a coating and developing apparatus is provided with a processing block including a liquid processing block disposed on the carrier block side and a heating processing block disposed on the interface block side. The liquid processing block includes a first unit block, a second unit block, and one or more of developing unit blocks overlying or underlying a stack of the first unit block and the second unit block. The first unit block includes antireflection film-forming modules and resist film-forming modules disposed on both sides of the transport passage thereof. The second unit block includes upper film-forming modules and hardening modules disposed on both sides of the transport passage thereof.
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申请公布号 |
US2012057861(A1) |
申请公布日期 |
2012.03.08 |
申请号 |
US201113219955 |
申请日期 |
2011.08.29 |
申请人 |
MATSUOKA NOBUAKI;MIYATA AKIRA;HAYASHI SHINICHI;ENOKIDA SUGURU;TOKYO ELECTRON LIMITED |
发明人 |
MATSUOKA NOBUAKI;MIYATA AKIRA;HAYASHI SHINICHI;ENOKIDA SUGURU |
分类号 |
G03D5/04 |
主分类号 |
G03D5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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