发明名称 SEMICONDUCTOR DEVICE AND CONTROL METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device having such a structure with which self turn-on due to noise does not take place easily and in which recovery loss can be reduced. <P>SOLUTION: A gate electrode 8 has a double gate structure with first and second gate electrodes 8a, 8b of different depth. With such a structure, an inversion layer is formed for a p-type base region 3 by turning only the first gate electrode 8a out of the first and second gate electrodes 8a, 8b, but the inversion layer may be formed not deep enough to connect an n<SP POS="POST">-</SP>type drift layer 2 and an n<SP POS="POST">+</SP>-type impurity region 4. The first gate electrode 8a functions as an excessive carrier injection inhibition gate. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012049499(A) 申请公布日期 2012.03.08
申请号 JP20110027994 申请日期 2011.02.11
申请人 DENSO CORP;TOYOTA CENTRAL R&D LABS INC 发明人 NISHIZUMI HIROTAKA;YAMAMOTO TAKESHI;MIZUNO SHOJI;SUMITOMO MASAKIYO;SAKAKIBARA JUN;FUJII TETSUO;HATTORI YOSHIKUNI;TAGUCHI RIE;KUWABARA MAKOTO
分类号 H01L29/78;H01L21/336;H01L27/04;H01L29/423;H01L29/49;H01L29/739;H01L29/861 主分类号 H01L29/78
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