发明名称 |
SEMICONDUCTOR DEVICE AND CONTROL METHOD THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor device having such a structure with which self turn-on due to noise does not take place easily and in which recovery loss can be reduced. <P>SOLUTION: A gate electrode 8 has a double gate structure with first and second gate electrodes 8a, 8b of different depth. With such a structure, an inversion layer is formed for a p-type base region 3 by turning only the first gate electrode 8a out of the first and second gate electrodes 8a, 8b, but the inversion layer may be formed not deep enough to connect an n<SP POS="POST">-</SP>type drift layer 2 and an n<SP POS="POST">+</SP>-type impurity region 4. The first gate electrode 8a functions as an excessive carrier injection inhibition gate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012049499(A) |
申请公布日期 |
2012.03.08 |
申请号 |
JP20110027994 |
申请日期 |
2011.02.11 |
申请人 |
DENSO CORP;TOYOTA CENTRAL R&D LABS INC |
发明人 |
NISHIZUMI HIROTAKA;YAMAMOTO TAKESHI;MIZUNO SHOJI;SUMITOMO MASAKIYO;SAKAKIBARA JUN;FUJII TETSUO;HATTORI YOSHIKUNI;TAGUCHI RIE;KUWABARA MAKOTO |
分类号 |
H01L29/78;H01L21/336;H01L27/04;H01L29/423;H01L29/49;H01L29/739;H01L29/861 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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