发明名称 |
Linear Cluster Deposition System |
摘要 |
A linear cluster deposition system includes a plurality of reaction chambers positioned in a linear horizontal arrangement. First and second reactant gas manifolds are coupled to respective process gas input port of each of the reaction chambers. An exhaust gas manifold having a plurality of exhaust gas inputs is coupled to the exhaust gas output port of each of the plurality of reaction chambers. A substrate transport vehicle transports at least one of a substrate and a substrate carrier that supports at least one substrate into and out of substrate transfer ports of each of the reaction chambers. At least one of a flow rate of process gas into the process gas input port of each of the reaction chambers and a pressure in each of the reaction chambers being chosen so that process conditions are substantially the same in at least two of the reaction chambers.
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申请公布号 |
US2012058630(A1) |
申请公布日期 |
2012.03.08 |
申请号 |
US20100877775D |
申请日期 |
2010.09.08 |
申请人 |
QUINN WILLIAM E.;GURARY ALEXANDER;PARANJPE AJIT;FERREIRA MARIA D.;FREMGEN, JR. ROGER P.;ARMOUR ERIC A.;VEECO INSTRUMENTS INC. |
发明人 |
QUINN WILLIAM E.;GURARY ALEXANDER;PARANJPE AJIT;FERREIRA MARIA D.;FREMGEN, JR. ROGER P.;ARMOUR ERIC A. |
分类号 |
H01L21/36;C23C16/00;C23C16/06;C23C16/08;C23C16/44 |
主分类号 |
H01L21/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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