发明名称 Process for color filter array residual pigment removal
摘要 A method of fabricating a color filter array including the removal of unwanted residual color pigments. A substrate is coated with a colored photoresist layer. The photoresist layer is patterned. The substrate is then cured. A descumming step is performed after the curing step to remove the residual pigments without causing significant damage to the remaining color filter array pattern. In another embodiment, the descumming process may be used to control or manipulate the thickness of the color filter array. In another embodiment, the descumming process may be used to modify the surface of the color filter array to be more desirable for the formation of microlenses or other layers over the color filter array.
申请公布号 US8129079(B2) 申请公布日期 2012.03.06
申请号 US20070003013 申请日期 2007.12.19
申请人 HODGE EARNEST;MCCLURE BRENT A.;APTINA IMAGING CORPORATION 发明人 HODGE EARNEST;MCCLURE BRENT A.
分类号 G02B5/20 主分类号 G02B5/20
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