发明名称 |
Processes and materials for step and flash imprint lithography |
摘要 |
A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described. |
申请公布号 |
US8128832(B2) |
申请公布日期 |
2012.03.06 |
申请号 |
US20080051584 |
申请日期 |
2008.03.19 |
申请人 |
DIPIETRO RICHARD ANTHONY;HART MARK WHITNEY;HOULE FRANCES ANNE;ITO HIROSHI;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DIPIETRO RICHARD ANTHONY;HART MARK WHITNEY;HOULE FRANCES ANNE;ITO HIROSHI |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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