PATTERNED MASK AND METHOD OF MANUFACTURING THE PATTERNED RETARDER USING THE SAME

摘要

PURPOSE: A patterned mask and a method for manufacturing a patterned retarder using the same are provided to decrease a mask operation by omitting an exposing device and an aligning device. CONSTITUTION: A λ/2 filter(40) is patterned on a UV polarizer(10). An orientation direction of the patterned λ/2 filter is comprised by repeating a first area(20) and a second area(30). The first area is parallel with a transmission axis(11) of the polarizer. The second area makes 45 or 135 degrees with the transmission axis of the polarizer.