发明名称 |
POLISHING PAD AND METHOD FOR PRODUCING THE SAME |
摘要 |
<p>An object of the invention is to provide a polishing pad excellent in durability and in the adhesiveness between a polishing layer and a base material layer. The first invention relates to a polishing pad comprising a polishing layer arranged on a base material layer, wherein the polishing layer comprises a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 µm, the polyurethane foam comprises an isocyanate component and an active hydrogen-containing compound as starting components, and the active hydrogen-containing compound comprises 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.Figure: 1</p> |
申请公布号 |
SG177964(A1) |
申请公布日期 |
2012.02.28 |
申请号 |
SG20120001533 |
申请日期 |
2007.11.27 |
申请人 |
TOYO TIRE & RUBBER CO., LTD. |
发明人 |
FUKUDA, TAKESHI;HIROSE, JUNJI;NAKAMURA, KENJI;DOURA, MASATO;SATO, AKINORI |
分类号 |
B24B37/20;B24B37/24;B24D3/26;B24D11/00;B29C39/10;B29K75/00;B29K105/04;B29L31/00;B29L31/58;H01L21/304 |
主分类号 |
B24B37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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