| 摘要 |
<p>17IN-SITU RECLAIM OF VOLATILE COMPONENTS OF THE DISCLOSUREMethods, apparatus, and systems are provided for efficiently reclaiming solvents used to clean surfaces of semiconductor wafers, etc. More particularly, embodiments of the10 present invention provide an in-situ reclaim approach that utilizes condensing mechanisms to reclaim evaporated solvent components. In these embodiments, the condensing can occur within a proximity head itself and/or along a vacuum line running from the proximity head to a vacuum tank. Other embodiments of the present invention provide an in-situ reclaim approach that prevents the evaporation of solvents at the onset by maintaining appropriate15 equilibrium gas phase concentrations between the liquid chemistries and gases used to process wafer surfaces.Figure 2</p> |
