发明名称 Manufacturing method of transferring a wiring circuit layer on a metal support substrate to a semiconductor element
摘要 A wiring circuit layer 2 having a connecting conductor part 21 that can be connected to an electrode 31 of a semiconductor element 3 is formed on a metal support substrate 1 in a way such that the wiring circuit layer can be separated from the substrate 1, and that the connecting conductor part 21 is exposed on the upper face of the wiring circuit layer. The wiring circuit layer 2 is laminated on the element 3 while in a wafer state, and the connecting conductor part 21 and the electrode 31 are connected. Subsequently, the support substrate 1 is peeled from the wiring circuit layer 2, and the wafer is diced, whereby individual semiconductor devices are obtained.
申请公布号 US8124457(B2) 申请公布日期 2012.02.28
申请号 US20090634350 申请日期 2009.12.09
申请人 ODA TAKASHI;MORITA SHIGENORI;YOSHIDA NAOKO;NITTO DENKO CORPORATION 发明人 ODA TAKASHI;MORITA SHIGENORI;YOSHIDA NAOKO
分类号 H01L21/00 主分类号 H01L21/00
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