发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device and a semiconductor manufacturing device capable of preventing wire flow and uniforming external dimensions of the semiconductor device. <P>SOLUTION: A method of manufacturing a semiconductor device includes, when a semiconductor element is mounted, an electrode of the semiconductor element is connected to a wiring pattern of a substrate using a bonding wire, and a pre-sealing substrate where an external terminal is connected to a substrate electrode provided on the back of the substrate is resin-sealed: a first resin sealing process where the pre-sealing substrate is resin-sealed to make it as an in-sealing substrate using a sealing device by the compression mold sealing method; and a second resin sealing process where the in-sealing substrate is resin-sealed using the same sealing device as the one noted above by the transfer sealing method. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012039024(A) 申请公布日期 2012.02.23
申请号 JP20100180028 申请日期 2010.08.11
申请人 FUJITSU SEMICONDUCTOR LTD 发明人
分类号 H01L21/56 主分类号 H01L21/56
代理机构 代理人
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