发明名称 |
Y-Doped Barium Strontium Titanate For Stoichiometric Thin Film Growth |
摘要 |
Disclosed is a process for generating thin-film barium strontium titanate (“BST”) having a lattice comprised of a plurality of A lattice sites and a B lattice site, in which a yttrium may be found at a location of at least one location of the plurality of A lattice sites or the B lattice site. In one embodiment, the plurality of A lattice sites comprises a location for at least one from a group consisting of barium and strontium. In one embodiment, the B lattice site comprises a location for a titanium. A capacitor having the inventive Y-doped BST dielectric is also disclosed. |
申请公布号 |
US2012044610(A1) |
申请公布日期 |
2012.02.23 |
申请号 |
US201113284831 |
申请日期 |
2011.10.28 |
申请人 |
TAYLOR TROY R.;ELSASS CHRISTOPHER;AGILERF |
发明人 |
TAYLOR TROY R.;ELSASS CHRISTOPHER |
分类号 |
H01G5/013;B32B9/04;C04B35/50 |
主分类号 |
H01G5/013 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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