CHEMICAL MECHANICAL POLISHING PAD, METHOD FOR MANUFACTURING THE SAME, AND CHEMICAL MECHANICAL POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a chemical mechanical polishing pad having excellent storage stability, a method for manufacturing the same, and a chemical mechanical polishing method using the chemical mechanical polishing pad.

SOLUTION: The chemical mechanical polishing pad according to the present invention is a chemical mechanical polishing pad comprising a polishing layer, whose surface subjected to polishing has a silicon atom concentration or fluorine atom concentration of 0.5 to 10 atom% calculated by elemental analysis using x-ray photoelectron spectroscopy (XPS).

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